Using a DC reactant magnetron, titanium dioxide nanostructured thin films were created on glass substrates in this study. sputtering method The plasma spraying system's operational parameters were optimized, while the sedimentation duration was varied to find the best conditions for getting high-quality samples. At various Sedimentation periods,single phase (anatase) TiO2 thin films were produced utilizing an Ar:O2 gas mixture in a 50:50 ratio (1, 1:30, 2, 2:30,3 hours). These thin films' multilayer architectures They were made with the same mixing ratio following a one-hour sedimentation period. X-ray diffraction, atomic force microscopy, and scanning electron microscopy were used to examine the structural properties of the produced samples

fluorescence, titanium oxide, uv- visible , DC reactant magnetron